$78.00
Takigen | HiPR-6512
Description
<p>HiPR-6512 Positive Photoresist Cabinet. Can be used in any way, or for any purpose you choose. Freight shipping required, local pick-up welcomed (Phoenix, AZ).</p>
<p><strong>Manufacturer Description:</strong></p>
<ul>
<li align="left">HiPR 6500 is an advanced g- and i-line compatible positive photoresist in a safer solvent formulation.</li>
<li align="left">HiPR 6500 is a production viable system for both g-line and i-line exposure requiring <300mJ/cm 2 utilizing TMAH developers with concentrations from .26N -.23N.</li>
<li align="left">Thermal stability exceeds most conventional products currently in production.</li>
<li align="left">HiPR 6500 demonstrates remarkable submicron production exposure latitude of greater than 40% for a 10% Critical Dimension window at geometries of 0.8µ.</li>
<li align="left">Near vertical profiles down to 0.5µ resolution.</li>
<li align="left">Uniquely formulated for increased photospeed allowing higher production throughput for both submicron g-line and i-line steppers.</li>
<li align="left">Thermal stability characteristics (>125°C) provide a robust, harsh plasma etch tolerance.</li>
<li align="left">Compatible with established FUJIFILM developers for ease of implementation.</li>
<li align="left">Ethyl lactate/EEP Solvent formulation permits a safer workplace environment.</li>
</ul>
<p><strong>Specifications:</strong></p>
<p>Dimensions: 19.5" x 23.5" x 55.5" (l x w x h)</p>
<p>Unit has four gas inlet/outlets on back, three of which are fitted w/ Swagelok fittings.</p>
<p align="left">Solids (%) Min. 26.5</p>
<p align="left">Solids (%) Max. 27.5</p>
<p align="left">Viscosity (cps) Min 33.8</p>
<p align="left">Viscosity (cps) Max 36.2</p>
<p align="left">Water Content <0.5%</p>
<p align="left">Filtration 0.2 micron</p>
<p align="left">Refractive Index 1.6441</p>
<p align="left">Flash Point 55 degrees C (closed cup)</p>
<p>Trace Metals None >50ppb</p>